- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/00 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patent holdings for IPC class G03F 1/00
Total number of patents in this class: 1484
10-year publication summary
|
126
|
84
|
60
|
64
|
55
|
29
|
26
|
18
|
15
|
4
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| ASML Netherlands B.V. | 6816 |
91 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
88 |
| Hoya Corporation | 2822 |
82 |
| Shin-Etsu Chemical Co., Ltd. | 5132 |
64 |
| Boe Technology Group Co., Ltd. | 35384 |
46 |
| Samsung Electronics Co., Ltd. | 131630 |
45 |
| Micron Technology, Inc. | 24960 |
39 |
| Samsung Display Co., Ltd. | 30585 |
31 |
| Kioxia Corporation | 9847 |
29 |
| Synopsys, Inc. | 2829 |
24 |
| Carl Zeiss SMS GmbH | 56 |
22 |
| Texas Instruments Incorporated | 19376 |
21 |
| Nikon Corporation | 7162 |
21 |
| Carl Zeiss SMT GmbH | 2646 |
20 |
| GLOBALFOUNDRIES U.S. Inc. | 6459 |
18 |
| LG Chem, Ltd. | 17205 |
17 |
| FUJIFILM Corporation | 27102 |
17 |
| United Microelectronics Corp. | 3921 |
17 |
| Au Optronics Corporation | 3880 |
17 |
| Applied Materials, Inc. | 16587 |
16 |
| Other owners | 759 |